Conference

Conference 1: Large Mirror and Telescopes 

 Myung Cho, NOAO (USA) 

 Bin FAN, Institute of Optics and Electronics, CAS (China) 


 We invite you to submit papers on the following and related topics to this conference. 

 • Mirrors for large astronomical and space telescopes 

 • Light-weighted mirror technology 

 • Large deployable mirror and telescopes 

 • New and innovative mirror and telescope designs 

 • Advanced testing methods for large mirror 

 • Support systems and structures 

 • New material for large mirrors 

 • Innovative concepts and designs




Conference 2: Advanced Optical Manufacturing Technologies 

 Wenhan JIANG, Academician, Chinese Academy of Engineering, IOE, CAS (China) 

 Oltmann Riemer, IWT Univ. of Bremen (Germany) 

 Li YANG, COMT, COS (China) 

 Shengyi LI, National Univ. of Defense Technology (China) 


 Please submit papers on the following and related topics to this conference.

 • Advanced optical manufacturing technologies 

 • Aspheric optics design, manufacturing and testing 

 • Ultra-precision freeform surfaces design, manufacturing and Testing 

 • Super-precision optical manufacturing

 • Optical thin film coatings 

 • Advanced Diamond turning technology 

 • Magnetorheological Optical Processing 

 • Advanced ion beam finishing and atmospheric plasma technology 

 • EEM (Elastic Emission Machining) and CVM (Chemical Vaporization Machining) processing technology for super smooth surface with atomic lever 

 • Optical design and simulation software and tool

 • Optoelectronics components and modules integration and manufacturing

 • Opto-mechanical components and devices • Laser manufacturing technology and equipment




Conference 3: Optical Test, Measurement Technology, and Equipment 

 Yudong ZHANG, IOE, CAS (China) 

 Wei GAO, Tohoku University (Japan) 

 Sandy To, Hong Kong Polytechnic University (China) 

 Fan WU, Institute of Optics and Electronics, CAS (China)


 Please submit papers on the following and related topics to this conference. 

 • Test for optical freeform surface 

 • Test for aspheric optical surface 

 • Test for super- precision optical surface 

 • Measurement for super smooth surface 

 • Measurement of optical thin film

 • Test with infrared technologies 

 • Optical contamination 

 • Optical test and measurement for nanometer technology

 • New and innovative metrology and equipment 

 • Analysis and modeling tools and software




Conference 4: Design, Manufacturing and Testing of Micro and Nano Optical Devices and Systems 

 Tianchun YE, Institute of Microelectronics, CAS (China) 

 Alexander Poleshchuk, Institute of Automation and Electrometry, Siberian Branch of Russian Academy of Sciences, Novosibirsk, Russia 

 Song HU, Institute of Optics and Electronics, CAS (China) 


 Papers on the following and related topics should be submitted to this conference. 

 • Micro and nano optical system design, manufacturing and testing 

 • Nano metrology technology and tools 

 • Nanoscale imaging and sensing technologies 

 • Nanofluidics device design, fabrication and testing

 • Fabrication of MEMS/MOEMS devices 

 • Testing and Characterization of MEMS/MOEMS 

 • MEMS/MOEMS reliability 

 • Packaging of MEMS/MOEMS devices

 • Next generation lithography 

 • EUVL research and development 

 • Advances in thin film coating for MEMS 

 • Microfluidics, BioMEMS, and Medical Microsystems




Conference 5: Opto-Electronics Material and Devices for Sensing and Imaging 

 Yadong JIANG, University of Electronic Science and Technology of China 

 Bernard Kippelen, Center of Organic Photonics and Electronics, Georgia Institute of Technology (USA) 

 Junsheng YU, State Key Laboratory of Electronic Thin Films and Integrated Devices (China)


The primary topics for this conference are as following: 

 • Properties of optoelectronic materials 

 • Nano materials for optoelectronic device application 

 • Properties of sensing materials in detector technology 

 • Detector design, integration and fusion

 • Detector data collection and analysis 

 • Vision and image processing 

 • Novel display and processing techniques

 • Organic and polymer light emitting device for displays and lighting 

 • LED and OLED related technologies 

 • Thin film transistors technology 

 • Organic and polymer memory devices




Conference 6: Smart Structure and Materials in Advanced Optical Technology

 Xiangang LUO, Institute of Optics and Electronics, CAS (China) 


 Papers on the following and related topics are welcome for this conference. 

 • Smart structures and materials

 • Metal-material design, manufacture, characterization and application 

 • Optical fiber sensors and applications 

 • Plasmonic devices and sensors

 • Directive antenna 

 • Design, fabrication, and application of nanostructures 

 • Passive and active vibration isolation systems

 • Shape memory alloys 

 • SMA- and piezo-based materials and systems 

 • Aircraft, MAV/UAV and morphing systems




Conference 7: Sub-nanometer Accuracy Measurement for Synchrotron Optics and X-ray Optics 

 Shinan QIAN, Brookhaven National Laboratory (USA)

 Mourad Idir, Brookhaven National Laboratory (USA) 

 Daniele Cocco, SLAC National Accelerator Laboratory (USA) 

 Tiqiao XIAO, Shanghai Synchrotron Radiation Facility (China) 

 Kazuto Yamauchi, University of Osaka (Japan)


Papers on the following and related topics are welcome for this conference. 

 • Requirements and specifications for synchrotron radiation and free electron laser mirrors, for wavefront preserving and nano-focusing x-ray mirrors 

 • Measurement science and technology for sub-nanometer (or sub-50-nrad) accuracy for meter-scale plane, spherical and aspherical-mirrors 

 • Design and measurement of next-generation surface profilometer with: Sub-nanometer accuracy Easy and fast calibration process Possibility to measure high-spatial-frequency Small aperture autocollimator development with ultra high accuracy 

 • Calibration methods and devices for sub-nanometer accuracy 

 • Manufacturing of sub-nanometer accuracy mirrors 

 • High accuracy in-situ metrology at beam lines