The 8th International Symposium on

26-29 April 2016
Suzhou, China
HomePagethe first step: (Submit your paper to [toAOMATT]) system. The second setp: (submit the paper to [SPIE])
Register Conferences Special Events Travel / General Past Program Chair Info

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@ Detail
Call for papers (English)(Chinese)
Invitation to Participate
Technical Program (PDF)
Printed Call for Papers (PDF)
Sample Manuscript (pdf doc)
Templates for Download (doc)
Copyright Transfer Form (PDF )
Invitation (PDF Doc)
Hotel Order Form outside the mainland of China (Doc)

Visa Letter Request Form (pdf doc)

Registration Form for Chinese(Pdf)
Registration Form outside the mainland of China(Pdf)


Special Events
Past Program
Author Info
Chair Info

@ Submit an Abstract

Submit an Abstract
Submission Guidelines
Yang Li


  P.O. Box 350, Shuangliu, Chengdu, China 610209

Advanced Optical Manufacturing
and Testing
Technologies 2016


Conference 7: Sub-nanometer Accuracy Measurement for Synchrotron Optics and X-ray Optics

Shinan QIAN, Brookhaven National Laboratory (USA)
Mourad Idir, Brookhaven National Laboratory (USA)
Daniele Cocco, SLAC National Accelerator
Laboratory (USA)
Tiqiao XIAO, Shanghai Synchrotron Radiation Facility (China)
Kazuto Yamauchi, University of Osaka (Japan)
AOMATT2016 SPIE Proceeding Vol. 9688

Papers on the following and related topics are welcome for this conference.

• Requirements and specifications for synchrotron radiation and free electron laser mirrors, for wavefront preserving and nano-focusing x-ray mirrors
• Measurement science and technology for sub-nanometer (or sub-50-nrad) accuracy for meter-scale plane, spherical and aspherical-mirrors
• Design and measurement of next-generation surface profilometer with:
Sub-nanometer accuracy
Easy and fast calibration process
Possibility to measure high-spatial-frequency
Small aperture autocollimator development with ultra high accuracy
• Calibration methods and devices for sub-nanometer accuracy
• Manufacturing of sub-nanometer accuracy mirrors
• High accuracy in-situ metrology at beam lines


@ Important Dates

Conference Dates
April 26-29, 2016
Abstract Due:
Jan 30, 2016

Manuscript Due:
March 30, 2016

Registration Date
April 25, 2016
Publishing Date

@ Sponsored By

The Institute of Optics and Electronics
The Chinese Optical Society
@ Technical Cosponsor
The International Society for Optics and Photonics

@ Cooperating

*Soochow University

Copyright @ Organizing Committee All Rights Reserved
AOMATT China 2016