The 5th International Symposium on

26-29 April 2010
Dalian, China
HomePage   (Submit your abstract through "toAOMATT")[Technical Program final version Download]
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@ Detail
Notice (English)(Chinese)
Invitation to Participate
Technical Program (PDF)
Printed Call for Papers (PDF)
Sample Manuscript (pdf)
Templates for Download (doc)
Copyright Transfer Form (pdf )
Invitation (PDF Doc)
Hotel Order Form(pdf) (Doc)

Visa Letter Request Form (pdf doc)

Registration Form(Pdf)


Special Events
Past Program
Author Info
Chair Info

@ Submit an Abstract

Submit an Abstract
Submission Guidelines
Yang Li
  P.O. Box 350, Shuangliu, Chengdu, China 610209

Advanced Optical Manufacturing
and Testing
Technologies 2010



Conference 4: Design, Manufacturing and Testing of Micro and Nano Optical Devices and Systems SPIE VOL.7657

Conference Chairs:
YE Tianchun, Director of Institute of Microelectronics, Chinese Academy of Science (ChinaŁ©
Sen Han, Veeco, Inc. (USA)
Masaomi Kameyama, Nikon Corporation (Japan)
HU Song, Institute of Optics and Electronics (IOE), CAS (China)

Program Committee:
LI Yanqiu, Beijing Institute of Technology (China)
Li-Anne Liew, National Institute of Science and Technology (USA)
WANG Xiangchao, Shanghai Institute of Optics and Fine Mechanic, CAS (China)
LI Zhihong, MEMS Center, Beijing University (China)
Yao Li, Centre for Composite Materials, Harbin institute of Technology (China)
Ming Liu, Institute of Microelectronics, CAS (China)
Tadashi Hatano, Tohoku University (Japan)
LI Xiaoping, Shanghai Micro Electronic Equipment Co Ltd China)
Zhichun Ma, Ford Motor Company (USA)
Sung Moon, Korean Institute of Science and Technology (Korea)
ZHAO Qingliang, Harbin institute of Technology (China)

Papers on the following and related topics should be submitted to this conference.

  • Micro-nano optical system design
  • Micro-nano Optical manufacturing and testing
  • Nano metrology technology and tools
  • Nanoscale imaging and sensing technologies
  • Nanofluidics device design, fabrication and testing
  • Fabrication of MEMS/MOEMS devices
  • Testing and Characterization of MEMS/MOEMS
  • MEMS/MOEMS reliability
  • Packaging of MEMS/MOEMS devices
  • Next generation lithography
  • EUVL research and development
  • Advances in thin film coating for MEMS Microfluidics, BioMEMS, and Medical Microsystems



@ Important Dates

Conference Dates
26¨C29 April 2010
Abstract Due:
15 December 2009
Manuscript Due:
30 March 2010
Registration Date
25 April 2010
Publishing Date
30 September 2010

@ Sponsored By

The Institute of Optics and Electronics
The Chinese Optical Society
@ Technical Cosponsor
The International Society for Optics and Photonics

@ Cooperating

* German Society of Applied Optics
* Optics and Photonics Society of Singapore
* Optical Society of SichuanProvince
* State Key Laboratory of Microfabrication
* Dalian Institute of Chemical Physics, CAS
* Dalian University of Technology
* Changchun Institute of Fine Optical Machining and Physics, CAS
* ChangchunUniversity of Science and Technology
* NationalUniversity of Defense Technology
* Harbin Institute of Technology
* Beijing Institute of Technology
* University of Electronic Science and Technology of China
* Crystechcoating Inc.

Copyright @ Organizing Committee All Rights Reserved
AOMATT China 2010