The 4th International Symposium on

19-21 November 2008
Chengdu, China
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@ Detail
Notice (English)(Chinese)
Invitation to Participate
Technical Program (PDF)
Printed Call for Papers (PDF)
Sample Manuscript (pdf)
Templates for Download (doc)
Copyright Transfer Form (pdf )
Invitation (PDF Doc)
Hotel Order Form(pdf) (Doc)

Visa Letter Request Form (pdf doc)

Registration Form(Pdf)


Special Events
Past Program
Author Info
Chair Info

@ Submit an Abstract

Submit an Abstruct
Submission Guidelines
Yang Li
  P.O. Box 350, Shuangliu, Chengdu, China 610209

Advanced Optical Manufacturing
and Testing
Technologies 2008



Conference 4: Design, Manufacturing and Testing of Micro and Nano Optical Devices and Systems

Conference Chairs:
Sen Han, Veeco, Inc. (USA)
Jos Benschop, System Engineering and Research, ASML (Netherland)
Edgar Bader, Lithographic Optics Division, Carl Zeiss SMT AG(Germany)
Masaomi Kameyama, Nikon Corporation ( Japan)
LUO Xiangang, Institute of Optics and Electronics, CAS (China)
LI Yanqiu, Beijing Institute of Tedchnology (China)

Program Committee:
WANG Xiangchao, Shanghai Institute of Optics and Fine Mechanic, CAS (China)LI Zhihong, MEMS Center, Beijing University (China)
Li-Anne Liew, National Institute of Science and Technology (USA)
Ming Liu, Institute of Microelectronics, CAS (China)
YaoLi, Centre for Composite Materials, Harbin institute of technology (China)
Tadashi Hatano,Tohoku University(Japan)
Zhichun Ma, Michigan Aerospace Corp. (USA)
LI Xiaoping, Shanghai Micro Electronic EquipMment Co Ltd China)
Sung Moon, Korean Institute of Science and Technology (Korea)
ZHAO Qingliang, Harbin institute of technology (China)
FANG Fengzhou, Tianjing University (China)

Papers on the following and related topics should be submitted to this conference.

  • Micro-nano optical system design
  • Micro-nano Optical manufacturing and testing
  • Nano metrology technology and tools
  • Nanoscale imaging and sensing technologies
  • Nanofluidics device design, fabrication and testing
  • Fabrication of MEMS/MOEMS devices
  • Testing and Characterization of MEMS/MOEMS
  • MEMS/MOEMS reliability
  • Packaging of MEMS/MOEMS devices
  • Next generation lithography
  • EUVL research and development
  • Advances in thin film coating for MEMS Microfluidics, BioMEMS, and Medical Microsystems



@ Important Dates

Conference Dates
19ĘC21 November 2008
Abstract Due:
30 July 2008
Manuscript Due:
25 October 2008
Registration Date
18 November 2008

@ Sponsored By

The Institute of Optics and Electronics
The Chinese Optical Society
@ Technical Cosponsor
The International Society of Optical Engineering

@ Cooperating

*Committee of Optical Manufacturing Technology, COS
*Committee of Optical Testing Technology, COS
*SOS- Sichuan Optical Society

Copyright @ Organizing Committee All Rights Reserved
AOMATT China 2008